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发明名称
POSITIVE TYPE PHOTORESIST COMPOSITION
摘要
申请公布号
KR0146982(B1)
申请公布日期
1998.08.01
申请号
KR19950007145
申请日期
1995.03.30
申请人
KOREA KUMHO PETROCHEMICAL CO.,LTD
发明人
LEE, NOH-CHOL;KIM, SUNG-JOO;KIM, JONG-MOK;PARK, SUN-EE;KIM, KI-DAE
分类号
G03F7/004;G03F7/023;(IPC1-7):G03F7/023
主分类号
G03F7/004
代理机构
代理人
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