发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive material having the good touch when the material is touched with bare hands without the decrease in the effect of a matting agent of spherical silica in spite of heat development at a high temp. by having layers contg. this matting agent of a spherical silica on the surface of a base. SOLUTION: This photosensitive material has at least one layer of the layers contg. the matting agent of the spherical silica on at least one surface of the base. The material has at least one layers of photosensitive layers contg. photosensitive silver halide on at least one surface of the base. Further, the material contains an org. silver salt and a reducing agent for this silver salt. The photosensitive layers are formed by applying a coating liquid prepd. by dispersing a binder contg. >=50wt.% material having an equil. moisture content of <=2wt.% at 25C and 60% RH into a solvent contg. >=30wt.% water on the base, then drying the coating. The average particle size of the matting agent is from 0.5 to 10μm. The photosensitive material otherwise has at least one layer of the layers contg. the matting agents of the spherical silica on both surfaces of the base.
申请公布号 JPH10197983(A) 申请公布日期 1998.07.31
申请号 JP19960357890 申请日期 1996.12.27
申请人 FUJI PHOTO FILM CO LTD 发明人 HATAKEYAMA AKIRA
分类号 G03C1/498;G03C1/74;G03C1/76;(IPC1-7):G03C1/498 主分类号 G03C1/498
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