AMIDE OR IMIDE INTRODUCED NEW COPOLYMER, ITS PRODUCTION AND PHOTORESIST CONTAINING SAME

摘要

PROBLEM TO BE SOLVED: To improve etching resistance, heat resistance and adhesiveness, to prevent the rounding of the upper part of a pattern and to form a pattern having high resolving power by copolymerizing at least two kinds of aliphatic cycloolefins with amide or imide. SOLUTION: At least two kinds of aliphatic cycloolefins are copolymerized with amide or imide by radical polymn. at high temp. and pressure with the conventional radical polymn. initiator to produce the objective copolymer for a photoresist. The polymn. may be carried out by bulk polymn. or soln. polymn. and a solvent such as cyclohexanone, methyl ethyl ketone, benzene, toluene, dioxane or dimethylformamide or a mixture of them may be used as a polymn. medium.