PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME AND PRODUCTION OF PHOSPHOR PATTERN USING THEM

摘要

PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. capable of forming a phosphor pattern with high precision, to obtain a photosensitive element using the compsn. and to produce a phosphor pattern. SOLUTION: The objective photosensitive resin compsn. contains a phosphor contg. <500ppm by weight (expressed in terms of elemental sulfur) of sulfur or a sulfur-contg. compd. other than a phosphor. The objective photosensitive element has a layer of the photosensitive resin compsn. on the substrate film. The objective phosphor pattern is produced as follows; a layer 5 of the photosensitive resin compsn. is formed on the rugged surface of a substrate for a plasma display panel with a formed barrier rib 2, the layer 5 is imagewise irradiated with active light and selectively removed by development to form a pattern and this pattern is freed of the unnecessary components by firing.