| 发明名称 |
Composition for oxide cmp |
| 摘要 |
A chemical mechanical polishing composition comprising a soluble cerium compound at a pH above 3 and a method to selectively polish a silicon oxide overfill in preference to a silicon nitride film layer in a single step during the manufacture of integrated circuits and semiconductors. |
| 申请公布号 |
AU5532898(A) |
申请公布日期 |
1998.07.31 |
| 申请号 |
AU19980055328 |
申请日期 |
1997.12.19 |
| 申请人 |
CABOT CORPORATION |
发明人 |
GAUTAM S. GROVER;BRIAN L MUELLER |
| 分类号 |
C09K3/14;C09G;C09G1/02;C23F1/00;H01L21/302;H01L21/304;H01L21/3105 |
主分类号 |
C09K3/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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