| 摘要 |
PROBLEM TO BE SOLVED: To reduce the time-varying positional deviation of a membrane due to an irradiating X-ray be forming an artificial diamond film, having any of specified crystal orientation planes and single crystal structure on an Si frame. SOLUTION: After the top face of an Si wafer has been mirror surface finished, its surface is roughened, the wafer is set in a microwave plasma chemical vapor deposition apparatus to form a single-crystal-structured artificial diamond film having any of crystal orientation planes (100), (110) and (111) while adjusting a specified atmosphere pressure, the substrate temp., and bias voltage applied to the substrate, the bottom central area of the wafer is dissolved to form a Si frame having a window for an X-ray mask material. This makes the time- varying displacement of the membrane due to passing X-rays and suppresses the time-varying positional deviation of an integrated circuit being irradiated with it. |
