| 摘要 |
PROBLEM TO BE SOLVED: To registers the images of two chips with high accuracy, by providing register marks in the corresponding positions of each chip on a semiconductor wafer to be inspected or a reticle used for the stepper in exposure process. SOLUTION: The interval D between register marks 17 is made fixed or over so that the register may not be performed, with one phase slipped, at the time of register. This fixed interval depends upon the accuracy within what degree both X-Y coordinates can conform to each other with by the alignment to conform the X-Y coordinate stipulated by the chip made on a semiconductor wafer to be inspected and the X-Y coordinate that the X-Y stage 9 has to each other by means of a rotary stage 10 after loading the X-Y stage 9 with the semiconductor wafer to be inspected. In the case of the inspection of comparison between two chips, there is necessity to eliminate the geometrical distortion from the detected image. This distortion is caused by the astigmatism and coma which affect the focus condition on the object to be inspected of an electron beam, and the maximum distance of the interval D between marks for register comes to 300μm or under. |
