发明名称 GALLIUM NITRIDE SEMICONDUCTOR LASER
摘要 PROBLEM TO BE SOLVED: To improve adhesion to a heat sink, by forming a second conductivity type electrode on a second conductivity type contact layer and forming a first conductivity type electrode on a first conductivity type contact layer, a mesa structure side face and a second conductivity type contact layer at the mesa structure. SOLUTION: On a sapphire substrate 1 a GaN buffer layer 2, an n-type GaN contact layer 3, an n-type InGaN layer 4 and a multiple quantum well active layer 7, a p-type GaN contact layer, etc., are laminated. Mesa structures 12, 15 are formed by etching, a p-type electrode 13 is formed and mutually conducted electrodes 16-18 are formed. On the surface of an AlN heat sink board 19 Ti/Pt/Au layers 20, 21 and welding AuSn layers 22, 23 are formed. The p-type electrode 13 is adhered to the AuSn layer 22 and n-type electrode 17 is adhered to the AuSn layer 23, thus making the electrodes 13, 17 mutually flush and hence improving the adhesion to the heat sink board 19.
申请公布号 JPH10200213(A) 申请公布日期 1998.07.31
申请号 JP19970004202 申请日期 1997.01.14
申请人 NEC CORP 发明人 NIDOU MASAAKI
分类号 H01L33/06;H01L33/12;H01L33/32;H01L33/40;H01S5/00;H01S5/323;H01S5/343 主分类号 H01L33/06
代理机构 代理人
主权项
地址