发明名称 |
LOW METAL ION CONTAINING 4,4'-(1-(4-(1-(4-HYDROXYPHENYL)-1-METHYLETHYL)PHENYL)ETHYLIDENE)BISPHENOL AND PHOTORESIST COMPOSITIONS THEREFROM |
摘要 |
The present invention provides methods for producing TPPA having low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such TPPA for producing semiconductor devices using such photoresist compositions. |
申请公布号 |
EP0854850(A1) |
申请公布日期 |
1998.07.29 |
申请号 |
EP19960935977 |
申请日期 |
1996.09.25 |
申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
RAHMAN, M., DALIL;AUBIN, DANIEL, P. |
分类号 |
G03F7/027;C07C29/76;C07C37/82;C07C39/15;C08G8/08;C08L61/06;G03F7/022 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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