| 摘要 |
PROBLEM TO BE SOLVED: To obtain an FCC metal in which crystal orientation is properly regulated and suitable for the material for a sputtering target by regulating the respective ratio of the integrated intensity of the (200) plane and the (220) plane to that of the (111) plane in the crystals to specified value or below. SOLUTION: It is desirable that, as for crystal orientation, the FCC metal has random orientation for securing the uniformity of sputtered coating. As the evaluation therefor, heat treatment is executed so as to regulate the ratio of the integrated intensity of the (200) plane to that of the (111) plane in X-ray diffraction, i.e., I(200) /I(111) is regulated to <=2.3, and the integrated intensity of the (220) plane to that of the (111) plane, i.e., I(220) /I(111) is regulated to <=1.0. Furthermore, among FCC, particularly, the one having a Cu matrix is excellent in electromigration. Since the purity of Cu exerts a remarkable influence on the fine structure of the coating, the purity of the Cu matrix is regulated to >=6N. Moreover, the average grain size is preferably regulated to <=200μm.
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