| 摘要 |
PROBLEM TO BE SOLVED: To obtain an antireflection material excellent in antireflection property and durability by forming a thin film layer contg. SiO2 and MgF2 in a specified molecular ratio on a substrate and providing a curable resin layer in between. SOLUTION: A plastic film is appropriately used as a substrate from the standpoint of flexibility, etc. The thin film layer contains SiO2 and MgF2 in 1:0.05 to 1:0.5 molar ratio and has >=1.5% minimum reflectance in 380-780nm wave length region. Although the thin film layer is formed by various conventional methods, resistance-heated vapor deposition is preferably applied from the standpoint of production capacity. A curable resin layer functioning as a hard coat layer is interposed between the substrate and thin film layer, and an antireflection material also excellent in scratch resistance is obtained. A UV-curing resin, etc., are used as the curable resin layer, and its thickness is controlled to 3 to 10μm. |
