| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photopolymerizable composition more highly sensitive to long-wavelength light such as visible light by mixing an addition- polymerizable compound having at least one ethylenic unsaturation with a photopolymerization initiator system comprising a pyran-ring-containing sensitizer and a compound which can generate active radicals upon irradiation in the presence of the sensitizer. SOLUTION: This composition comprises an addition-polymerizable compound having at least one ethylenic unsaturation and a photopolymerization initiator which comprises a sensitizer of formula I and a compound which can generate active radicals upon irradiation with light in the presence of this sensitizer. In formula I, R and R<1> , which are independent of each other, are each cyano, a phenyl or naphthyl group which may be substituted or the like; Y is H or a 1-15C alkyl; and X is a group of formula II [m is 0 or 1; n is 1 or 2; R<2> and R<3> are each H or a 1-10C alkyl; R<4> is H, an alkyl or the like; R<5> to R<7> are each H, a halogen or the like; and R<8> and R<9> are each H or a 1-16C alkyl]. |
