发明名称 Element-isolated hydrogen-terminated diamond semiconductor device and its manufacturing method
摘要 A diamond semiconductor device having at least one MESFET integrated on a single diamond substrate and insulated from other semiconductor elements is made by preparing a homoepitaxial diamond film 1 having a hydrogen-terminated surface; then making a drain ohmic contact 3, a source ohmic contact 4, both of gold, and a gate electrode 5 of aluminum on the film 1; and changing a site of the hydrogen-terminated surface other than the site for the MESFET to be terminated with atoms other than hydrogen atoms.
申请公布号 US5786604(A) 申请公布日期 1998.07.28
申请号 US19950527809 申请日期 1995.09.13
申请人 TOKYO GAS CO., LTD. 发明人 YAMASHITA, SATOSHI;KAWARADA, HIROSHI;ITOH, MASAHIRO;NAKAMURA, NAOFUMI
分类号 H01L21/04;H01L21/338;H01L21/76;H01L29/16;H01L29/812;(IPC1-7):H01L31/031;H01L29/00;H01L29/12 主分类号 H01L21/04
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