| 摘要 |
An array (100) of M x N thin film actuated mirrors (101) includes an active matrix (120) having a substrate (122) with an array of M x N connecting terminals (124) and an array of M x N transistors, and an array of M x N actuating structures (111), wherein each of the actuating structures (111) being a bimorph structure, includes a second thin film electrode (165), a lower electrodisplacive member (185), an intermediate thin film electrode (135), an upper electrodisplacive member (175) and a first thin film electrode (155). Furthermore, there is disclosed a method for the manufacture thereof, the method comprising the steps of: providing an active matrix; forming a thin film sacrificial layer on top of the active matrix; removing selectively the thin film sacrificial layer; forming a second thin film electrode layer thereon; removing selectively the second thin film electrode layer; depositing a lower electrodisplacive layer; forming an intermediate electrode layer; depositing an upper electrodisplacive layer; forming a first thin film electrode layer, thereby forming a multiple layered structure; patterning the multiple layered structure into an array of M x N semifinished actuating structures; and removing the thin film sacrificial layer. <IMAGE> |
