发明名称 METHOD AND APPARATUS FOR REMOVAL OF INESSENTIAL OBJECT IN PERIPHERAL EDGE OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To remove an inessential object in the peripheral edge part on the surface of a substrate in its side face part and on its rear, without affecting the central region on the surface of the substrate. SOLUTION: A substrate 12 is supported by a support means 14 which comes into contact with only the rear side of the substrate 12 and which supports the substrate. A voltage at one potential is applied to a first electrode 20 for plasma generation, and a voltage at the other potential is applied to a second electrode 22 for plasma generation by a plasma generation means 18, which is constituted of the first electrode 20 for plasma generation and of the second electrode 22 for plasma generation, and which is arranged and installed on the rear side of the substrate 12. As a result, a plasma is generated under atmospheric pressure or under a pressure near it across the first electrode 20 for plasma generation and the second electrode 22 for plasma generation. Then, while the plasma generation means 18 is being moved relatively along the peripheral edge region 13 of the substrate 12, a gas which is activated by the plasma is blown to the peripheral edge region 13 from the rear side of the substrate 12, and an inessential object at the peripheral edge of the substrate 12 is removed.
申请公布号 JPH10189515(A) 申请公布日期 1998.07.21
申请号 JP19960355599 申请日期 1996.12.24
申请人 SEIKO EPSON CORP 发明人 TAKAHASHI KATSUHIRO;AOKI KOJI
分类号 H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/027
代理机构 代理人
主权项
地址