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发明名称
APPARATUS AND METHOD FOR ELECTRON-BEAM EXPOSURE
摘要
申请公布号
JPH10189418(A)
申请公布日期
1998.07.21
申请号
JP19960347888
申请日期
1996.12.26
申请人
SONY CORP
发明人
KAGAMI ICHIRO
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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