Position resolution of an interferometrially controlled moving stage by regression analysis

摘要

A method and apparatus for achieving high position resolution of a moving stage in a lithographic system utilized for the manufacture of semiconductor integrated circuits. A series of values of the stage position are measured using an interferometric system, and a present position of the stage is estimated using regression analysis applied to a selected number of the series of measured values. The resulting predicted position is of higher resolution than a single stage position measurement of the interferometric system.