发明名称 |
Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition |
摘要 |
A liquid coating composition for forming an anti-interference film over a photoresist film is prepared by combining a water-soluble, film-forming component with a specified fluorosurfactant or by combining said water-soluble, film-forming component with a fluorosurfactant and a specified anionic surfactant. A coating film is formed from said liquid coating composition over a photoresist film to produce a photoresist material of a dual structure. The photoresist material is particularly effective in lessening the multiple-interference effect of light, thereby enabling the formation of very fine resist patterns having high fidelity to mask patterns.
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申请公布号 |
US5783362(A) |
申请公布日期 |
1998.07.21 |
申请号 |
US19970797988 |
申请日期 |
1997.02.12 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
WAKIYA, KAZUMASA;KOBAYASHI, MASAKAZU;NAKAYAMA, TOSHIMASA |
分类号 |
C08F2/44;G03F7/004;G03F7/09;(IPC1-7):G03C1/76 |
主分类号 |
C08F2/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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