发明名称 Werkwijze en inrichting voor het absorberen en verwijderen van contaminantdeeltjes uit een binnengebied van een ionenimplantatieinrichting.
摘要 The particles are made to adhere to a surface of a particle collector (74), which is secured to the ion implant device (10) in such a way that this surface is located inside the air passage at a location close to the ion path (14). The collector is periodically removed from the device so that particles can be removed from its surface. An independent claim is also included for an ion implant device provided with the particle collector and a support for removably mounting the collector inside it.
申请公布号 NL1005011(A1) 申请公布日期 1998.07.16
申请号 NL19971005011 申请日期 1997.01.15
申请人 EATON CORPORATION 发明人 JULIAN GASKILL BLAKE;ROBERT BECKER;DAVID CHIPMAN;MARY JONES;LYUDMILA MENN;FRANK SINCLAIR;DALE KEITH STONE
分类号 H01J37/30;H01J37/317 主分类号 H01J37/30
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