Mikromechanische Halbleiteranordnung und Verfahren zur Herstellung einer mikromechanischen Halbleiteranordnung
摘要
The invention relates to a micromechanical semiconductor array comprising a membrane (7) formed inside a hollow space (9). The membrane (7) is configured by a crystalline layer inside the substrate (1) or inside an epitaxial layer sequence of the semiconductor array placed inside a substrate (1). The membrane (1) is placed on the edge segment on a support (6) and covered by a covering layer (4) held on a counter-support (5). The support (6), the counter-support (5) and the membrane are all made of materials with different etching rates in relation to a predetermined wet-chemical etching agent and preferably consist of materials with different doping.
申请公布号
DE19700290(A1)
申请公布日期
1998.07.16
申请号
DE1997100290
申请日期
1997.01.03
申请人
SIEMENS AG, 80333 MUENCHEN, DE
发明人
MUELLER, KARLHEINZ, 84478 WALDKRAIBURG, DE;KOLB, STEFAN, 85716 UNTERSCHLEISHEIM, DE