发明名称 ARTICULATED PLATFORM MECHANISM FOR LASER PATTERN GENERATION ON A WORKPIECE
摘要 An articulated platform mechanism (10) includes a base, a mounting frame (11) including a platform (12), the frame having multiple attach portions (14); a mounting (70) attached to each of the attach portions; a series of cams (16) each having at least one cam surface; a series of crowned cam followers (15, 18); a series of drive motors (19); one of each of the cams or one of each of the followers being attached to each one of the mountings, the other of the cams and the followers being in rolling association with respective ones of each cam or cam follower; and wherein each motor drives a respective cam or follower not attached to the mountings, to actuate the platform in vertical lift, tilt front-to-back and tilt left-to-right.
申请公布号 CA2248002(A1) 申请公布日期 1998.07.16
申请号 CA19972248002 申请日期 1997.12.24
申请人 ETEC SYSTEMS, INC. 发明人 COVELLO, JAMES A.;HILL, DAVID R.
分类号 H05K3/00;G03F7/20;H01L21/027;(IPC1-7):B23Q3/02 主分类号 H05K3/00
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