| 摘要 |
PROBLEM TO BE SOLVED: To form a light shielding layer of active matrix element without increasing the production processes. SOLUTION: An insulating layer 10 is formed on a TFT 3, a gate bus wiring and a source bus wiring. An electrode 12b for forming a color filter (a pixel electrode) connected with a drain electrode 9b so formed on the insulating layer 10 and an electrode connected with a source electrode 9a electrically isolated from the electrode for forming the color filter 12b is formed on the TFT 3 via an insulating film. At first, a light shielding layer 18 is formed on the electrode formed on the TFT 3 by an electrochemical means, by an electrodeposition method, for example, by applying voltage only to the source bus wiring. Thereafter, a color filter 13 is formed on the electrode 12b for forming the color filter by the electrochemical means, by the electrodeposition method, for example, by applying voltage to the source but wiring and the gate but wiring. |
