发明名称 |
Projection optical system and exposure apparatus with the same |
摘要 |
The present invention relates to a both-side telecentric projection optical system and an exposure apparatus equipped with this projection optical system. In particular, the projection optical system has a structure for quite favorably correcting various kinds of aberration such as distortion in particular, while securing a relatively broad exposure area and a large numerical aperture.
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申请公布号 |
US5781278(A) |
申请公布日期 |
1998.07.14 |
申请号 |
US19970901681 |
申请日期 |
1997.07.28 |
申请人 |
NIKON CORPORATION |
发明人 |
MATSUZAWA, HITOSHI;SUENAGA, YUTAKA;KOBAYASHI, MISAKO |
分类号 |
G02B13/24;G02B13/22;G03F7/20;(IPC1-7):G02B9/62;G03B27/42;G03B27/44 |
主分类号 |
G02B13/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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