发明名称 |
X-ray exposure system |
摘要 |
An x-ray exposure system that reduces the time required to evacuate an internal chamber of a vacuum vessel, uses a low-power laser to produce the plasma that generates the x-rays, and enables the sample to be maintained outside the vacuum vessel. The system includes a detachable cover member that hermetically seals the opening of the vacuum vessel. The cover member includes a through-hole that forms an x-ray irradiation window and is sealed by an x-ray transmission member. In the through-hole, an x-ray generation target is provided that is irradiated by an external laser beam, via a laser beam entry window.
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申请公布号 |
US5781608(A) |
申请公布日期 |
1998.07.14 |
申请号 |
US19970948241 |
申请日期 |
1997.10.09 |
申请人 |
AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY, MINISTRY OF INTERNATIONAL TRADE & INDUSTRY |
发明人 |
TOMIE, TOSHIHISA;SHIMIZU, HIDEAKI;MAJIMA, TOSHIKAZU |
分类号 |
G21K5/02;G03F7/20;G21K7/00;H01L21/027;H05G2/00;(IPC1-7):H05G2/00 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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