发明名称 X-ray exposure system
摘要 An x-ray exposure system that reduces the time required to evacuate an internal chamber of a vacuum vessel, uses a low-power laser to produce the plasma that generates the x-rays, and enables the sample to be maintained outside the vacuum vessel. The system includes a detachable cover member that hermetically seals the opening of the vacuum vessel. The cover member includes a through-hole that forms an x-ray irradiation window and is sealed by an x-ray transmission member. In the through-hole, an x-ray generation target is provided that is irradiated by an external laser beam, via a laser beam entry window.
申请公布号 US5781608(A) 申请公布日期 1998.07.14
申请号 US19970948241 申请日期 1997.10.09
申请人 AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY, MINISTRY OF INTERNATIONAL TRADE & INDUSTRY 发明人 TOMIE, TOSHIHISA;SHIMIZU, HIDEAKI;MAJIMA, TOSHIKAZU
分类号 G21K5/02;G03F7/20;G21K7/00;H01L21/027;H05G2/00;(IPC1-7):H05G2/00 主分类号 G21K5/02
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