MANUFACTURE OF MAGNESIUM OXIDE FILM AND ITS MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To obtain a NaCl type crystal structure of MgO thin film with a wide forming condition regardless of the coefficient of linear expansion of a backing substrate, the substrate temperature and the heat treatment temperature at the time of forming the film and to easily manufacture a high quality of MgO thin film by using magnesium or magnesium oxide as a target and decomposing the vapor of compound containing magnesium and a reactive gas while sputtering on the substrate in pressure reduced plasma. SOLUTION: The inner part of a reactive chamber 1 is made to be a low pressure state with an exhausting means 7, next substrate 3 is heated with the heater 2 for heating the substrate. Oxygen as a material gas and a reactive gas obtained by vaporizing a starting material 18 with a vaporizer 15 is fed into the reactive chamber 1 together with a carrier gas with a material gas feeding means 9. When the electric power is fed between a substrate holder 4 and an electrode 5 under this state, plasma discharge is generated between them. The material gas is decomposed, a Mg gas being the component of the target 6 is sputtered, and the MgO thin film is formed on the surface of the substrate 3.