WAFER TRANSPORTING DEVICE FOR ION IMPLANTATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a wafer transporting device capable of shortening the time for replacement of used wafers and untreated wafers. SOLUTION: This device includes a shutter device 30 for loading wafers and a shutter device 40 for unloading the wafers arranged across a vacuum cassette 20 disposed at an ion implantation apparatus of a batch treatment type in-between. The respective shutter devices have shutter cassettes 31, 41 having plural wafer supporting sections corresponding to plural stages of wafer holding racks in the vacuum cassette. The respective shutter cassettes are constituted movably between the position where the transfer and reception of the wafers to and from the vacuum cassette are executed and the standby position parted therefrom. Plural stages of the wafer holding racks respectively hold the wafers in their central regions and the plural wafer supporting section respectively support the wafers at the point deviating from the central regions on both sides in their diametral direction.