| 发明名称 |
Antistatic photosensitive multilayered structure and method for producing the same |
| 摘要 |
An antistatic photosensitive multilayered structure of the present invention has at least a photosensitive layer and an antistatic cover film on a substrate in this order.
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| 申请公布号 |
US5780202(A) |
申请公布日期 |
1998.07.14 |
| 申请号 |
US19950417549 |
申请日期 |
1995.04.06 |
| 申请人 |
TOYO BOSEKI KABUSHIKI KAISHA |
发明人 |
NAGAHARA, SHIGENORI;FUJIMURA, TOSHIAKI;TANAKA, SHINICHI |
| 分类号 |
G03C1/85;G03F7/09;(IPC1-7):G03C1/492 |
主分类号 |
G03C1/85 |
| 代理机构 |
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