| 发明名称 |
EXPOSURE METHOD OF PHOTO ETCHING |
| 摘要 |
PURPOSE:To remove whisker-type pattern defects due to diffraction, reflection, etc. of light at the time of exposure in the photo etching process of aluminium etc. |
| 申请公布号 |
JPS5216979(A) |
申请公布日期 |
1977.02.08 |
| 申请号 |
JP19750091973 |
申请日期 |
1975.07.30 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
YASUDA KIYOUMITSU;KIKUCHI NOBUO;IIMURA AKIO;SAITOU KIYOSHI |
| 分类号 |
H01L21/027;H01L21/302 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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