发明名称 PRODUCTION OF PHOSPHOR PATTERN
摘要 PROBLEM TO BE SOLVED: To obtain phosphor patterns of uniform shapes with high accuracy by press bonding a positive film which develops solubility in a developer by irradiation with active rays on a substrate for a plasma display panel formed with barrier ribs. SOLUTION: The positive film A4 which develops the solubility into the developer by irradiation with the active rays is press bonded onto the substrate for the plasma display formed with the barrier ribs. The sections formed with the phosphors of the positive film A4 which develops the solubility into the developer are imagewise exposed and developed. The positive film A4 of the exposed sections is removed. A negative typo photosensitive resin compsn. layer B5 contg. the phosphors and a thermoplastic resin layer C are thermally press bonded onto the substrate for the plasma display panel from which the positive film A4 is removed only in the desired parts by disposing the B layer 5 on the substrate side. The positions where the phosphors are formed are irradiated imagewise with the active layers. The unnecessary parts of the B layer 5 and the C layer are removed by development while remaining the positive film A4. The positive film A4 is removed. The unnecessary parts are removed by baking.
申请公布号 JPH10186645(A) 申请公布日期 1998.07.14
申请号 JP19960349252 申请日期 1996.12.27
申请人 HITACHI CHEM CO LTD 发明人 TANAKA HIROYUKI;NOJIRI TAKESHI;TACHIKI HIDEYASU;WADA YUMIKO;TAI SEIJI
分类号 G03F7/004;B32B7/02;C08F20/20;C09D4/06;C09K11/08;G03F7/26;G03F7/40;H01J9/227;(IPC1-7):G03F7/004 主分类号 G03F7/004
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