| 摘要 |
PROBLEM TO BE SOLVED: To inspect quickly, with reliability, defects occurring with no regularity and such faults as occurring evenly over the entire surface of an object which is to be inspected such as a wafer wherein the same pattern groups are regularly arrayed many. SOLUTION: The device comprises an electron gun 21, lens system 22 and 23 which makes electron beam converge on a to-be-inspected object 1 where plural same pattern groups are regularly arrayed, a deflecting system 24 which scans an electron beam, a detector 25 which detects the electron generated at the object 1, an A/D converter 8 which converts an image signal of electron into a digital image signal, a calculating means 15 wherein pattern's feature amount at a specified point on the object is calculated from the digital image signal for judging acceptable/not-acceptable against a standard of a good article, and a defect judging means 10 wherein image signals are compared each other for extracting nonconformity part to detect defects. |
