发明名称 |
COLORED PHOTORESIST, ITS METHOD AND INDUSTRIAL PRODUCT BY USING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To produce a photoresist compd. compatible to far ultraviolet exposure and forming a high resolving characteristic in submicron unit by comprising a resin binder, an optical active component and a dye compd. containing an anthracene group. SOLUTION: The photoresist is composed of the resin binder, the optical active component, an acid generating agent especially and the dye containing one or more chromophoric group capable of reducing an unnecessary reflection of exposure irradiation. A preferable dye is a high polymer material (resin dye) containing one or more chromophoric group effectively absorbing the far-ultraviolet exposure irradiation. The preferable chromophoric group is incorporated with a cyclic or heterocyclic polynominal part. An anthracene ester such as group expressed by formula -(C=O)O(CH2 )n -anthracene is included. The (n) in this case is an integer of zero to about 6. Other suitable chromophoric group is a hydroxyquinolinyl group, a quinolinyl such as phenanthrenyl group or a quinolinyl deriv. having a substd. at a ring. |
申请公布号 |
JPH10186647(A) |
申请公布日期 |
1998.07.14 |
申请号 |
JP19970307762 |
申请日期 |
1997.10.06 |
申请人 |
SHIPLEY CO LLC |
发明人 |
MORI JAMES MICHAEL;THACKERAY JAMES W;SINTA ROGER F;BELL ROSEMARY;MILLER-FAHEY ROBIN L;ADAMS TIMOTHY G;ZYDOWSKY THOMAS M;PAVELCHEK EDWARD K;DOCANTO MANUEL |
分类号 |
C08F20/10;C08L33/06;C09B69/10;G03F7/004;G03F7/038;G03F7/039;G03F7/09;G03F7/30;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
C08F20/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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