Exposure equipment for semiconductor device

摘要

The exposure equipment has an off-axis input light source, and an aperture (30) having element light sources (11) to determine the proceeding path of light emitted from the input light source and designed to be asymmetric w.r.t. to the starting point according to directional period of a hetero-periodicity pattern (P). The distance between the element light sources disposed in the horizontal and vertical directions in the aperture are determined from a degree of an off-axis input of the optimal light which equals to the wavelength of the light, divided by twice the period of the pattern multiplied by the numeric aperture of the lens. The element light source is a circle, a square, an arc, or a cut square and the element source array is of a rectangle or a cross shape.