| 摘要 |
<p>The pole pieces (11, 12) of a thin film head (25, 125) are formed by two thin film layers (14, 16) of the magnetic metal NiFe, each NiFe layer being about 20,000 angstroms thick. These two NiFe layers (14, 16) are separated by an electric insulating layer (15) of alumina (Al2O3), ceramic or NiFe oxide that is about 100 angstroms thick. In one embodiment, a hard-baked photoresist layer (400) is formed only around the edges (40) of the first NiFe layer (14), the electrical insulating layer (15) is deposited over the top surface (411) of the first NiFe layer (14) and over the hard-baked photoresist layer (400), and the second NiFe layer (16) is then deposited, thus providing a three-layer metal/insulator/metal pole piece (14, 15, 16) wherein the hard-baked photoresist blocks edge short circuiting between the two thin film NiFe layers (14, 16). In another embodiment, edge short circuiting is minimized by allowing a small filament of a high electrical resistance plating seed layer of NiFe (581) to extend between the two NiFe thin film layers (14, 16), the high resistance of these long and thin NiFe filaments being much greater than the resistance of the two NiFe thin film layers (14, 16).</p> |
