| 摘要 |
<p>On the effective face (24) of a shadow mask, electron beam passing hole arrays (32) are arranged along the y axis in accordance with a predetermined 4-degree polynominal. The diameter in the x axis direction of electron beam passing holes (31) constituting the electron beam passing hole arrays (32) are determined by the 4-degree polynominal in such a way as to have a certain proportion to the interval between the electron beam passing hole arrays (32) adjacent to each other.</p> |
