发明名称 METHOD FOR FORMING FILM BY PLASMA POLYMERIZATION AND APPARATUS FOR FORMING FILM BY PLASMA POLYMERIZATION
摘要 An electrode coated with a polymeric material at a percentage of covering of 50 to 100 % is used as the electrode facing that side of a continuous substrate on which a film is to be formed by plasma polymerization. Plasma polymerization is conducted under the conditions of an operating pressure of 10<-3> to 1 Torr to form a film on the substrate. Consequently, the method produces an excellent effect of remarkably suppressing abnormal discharge during the film formation by plasma polymerization, thus making it possible to stably form a film by plasma polymerization over long and thus improve the yield of the product. The film formed by the plasma polymerization has extremely good properties.
申请公布号 WO9829578(A1) 申请公布日期 1998.07.09
申请号 WO1997JP04866 申请日期 1997.12.26
申请人 TDK CORPORATION;TAKAI, MITSURU;MIYAZAKI, SHINJI;UEDA, KUNIHIRO;KANAZAWA, HIROMICHI 发明人 TAKAI, MITSURU;MIYAZAKI, SHINJI;UEDA, KUNIHIRO;KANAZAWA, HIROMICHI
分类号 B05D7/24;C08F2/46;C23C14/12;C23C14/56;(IPC1-7):C23C14/12 主分类号 B05D7/24
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