| 摘要 |
PURPOSE:To conduct the delivery of the material to be treated in a reliable ad accurate manner by a method wherein the material to be treated is conveyed by a roller conveying part to side of an aligner unit in an interface mechanism, and a centering means of the material to be treated is provided on the edge part of the roller conveying part. CONSTITUTION:A coating-developing device unit 1 is composed of a resist coating line 10 and a resist developing line 20, and the resist coating line 10 and the resist developing line 20 are connected to an aligner unit 40 through an interface mechanism 30. The semiconductor water 2, for which the treatment on the resist coating line 10 and stored in the interface mechanism 30, is carried to the delivery roller part 51 of a roller conveying part 50, it is centered by a stopper part 58 and brought to a standstill. Then, the semiconductor wafer 2 is moved into the aligner unit 40 by a wafer conveying arm 41, and a prescribed exposure treatment is conductor thereon. |
