| 摘要 |
The invention relates to a method for controlling an exposure device for photomechanical production of structured surfaces as an image of an electronically stored pattern, specially for the exposure of printing plates, wherein the exposure device comprises at least one light source (3), an imaging unit (8) consisting of movable grid-like arranged microscopic mirrors that can be individually controlled by electronic means, and imaging optics (9). In order to reduce exposure time without impairing quality, the invention provides that the pattern be electronically split into two dimensional partial images, that partial images be successively represented by the imaging unit (8) while at the same time representing the total surface of each partial image, and that partial exposures of surfaces to be structured be successively carried out. This is done by displacing the exposure head (1) fitted with the light source (3), the imaging unit (8) and the imaging optics (9) between two partial exposures from one exposure position to the other and by retaining said head there for exposure so that individual partial images can be regrouped to form a total image of the electronically stored pattern. |
