发明名称 A GaAsP epitaxial wafer and a method for manufacturing it
摘要 A GaAsP epitaxial wafer 10 which has a GaAs1-xPx (0.45 < x < 1) constant nitrogen concentration layer 6 formed by doping a constant composition layer with nitrogen wherein the constant nitrogen concentration layer 6 has the following upper and lower limits of nitrogen concentration: <MATH> <MATH> <IMAGE>
申请公布号 EP0852402(A1) 申请公布日期 1998.07.08
申请号 EP19980100025 申请日期 1998.01.02
申请人 SHIN-ETSU HANDOTAI COMPANY LIMITED 发明人 ENDO, MASAHISA;WATANABE, MASATAKA;KAISE, TSUNEYUKI
分类号 H01L21/205;H01L33/30 主分类号 H01L21/205
代理机构 代理人
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