发明名称 |
Exposure mask, method of producing the same, exposure mask producing apparatus, and method of forming surface profile on material using exposure mask |
摘要 |
A two-dimensional shape of a dotted pattern and optical densities of dots or sizes of dots having the same optical density are calculated as write data on the basis of a target distribution of transmittance. The dotted pattern is optically written on a photosensitive medium in accordance with the calculated write data, using a beam from a light source whose output is stepwise or sequentially variable. A latent dotted pattern on the photosensitive medium is developed, thereby obtaining an exposure mask having a desired two-dimensional distribution of transmittance expressed by the dotted pattern and the optical densities of dots or the sizes of dots having the same optical density. |
申请公布号 |
US5776639(A) |
申请公布日期 |
1998.07.07 |
申请号 |
US19960629224 |
申请日期 |
1996.04.08 |
申请人 |
RICOH OPTICAL INDUSTRIES, CO., LTD. |
发明人 |
UMEKI, KAZUHIRO;SATO, SHOSEN |
分类号 |
G03F1/08;G03F1/00;G03F1/14;G03F1/68;G03F1/76;G03F7/20;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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