发明名称 Photosensitive polyimide resin composition
摘要 Provided are photosensitive resin compositions comprising a polyamic compound having, at each terminal thereof, a specific actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group and a solvent. The photosensitive resin compositions of the invention are excellent in resist properties such as sensitivity and good in storage stability and can provide a film small in residual stress.
申请公布号 US5777068(A) 申请公布日期 1998.07.07
申请号 US19950527057 申请日期 1995.09.12
申请人 NIPPON ZEON CO., LTD.;FUJITSU LIMITED 发明人 TANAKA, AKIRA;TAZAKI, SATOSHI;SAKAMOTO, KEI;YONEDA, YASUHIRO;YOKOUCHI, KISHIO;MIZUTANI, DAISUKE;ISHIZUKI, YOSHIKATSU
分类号 G03F7/037;(IPC1-7):C08G73/10;C08G69/26 主分类号 G03F7/037
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