| 摘要 |
PROBLEM TO BE SOLVED: To conform a substrate holding device to a deep stage without inviting an increase of scale of the device by using an arm having a bending part as the arm having a movable supporting part and further preventing a location displacement means from being provided on the bending part. SOLUTION: One end of two first arms 5 is fixed to the movable part 2a of a moving mechanism 2 and one end of two second arms 6 having bending parts is fixed to the movable part 3a of a moving mechanism 3. Within the tip part of the second arm 6, a revolution driving mechanism 4 (location displacement means main body) having a revolution mechanism is provided. At the other end of the first arm 5, a pawl 7 (first supporting part) is provided. At the other end of the second arm 6, a movable pawl 8 (second supporting part) of a length H is provided. The movable pawl 8 is fixed to the output shaft 4a of the revolution driving mechanism 4. The movable pawl 8 performs a revolving motion with the second arm 6 as a center by revolving the output shaft 4a. The revolution driving mechanism 4 is provided on the side of the movable pawl 8 for the bending part of the second arm 6. |
