| 摘要 |
A method of in-situ fabrication of a Josephson junction having a laminar structure, the method comprising the steps of: (1) etching a planar substrate to yield a first planar segment, a second planar segment and a ramp segment, the ramp segment connecting the two planar segments at an angle thereto and the substrate having a constantly-decreasing thickness in the ramp segment; (2) depositing a first superconductive layer on the substrate; (3) depositing a non-superconductive layer on the first superconductive layer; and (4) depositing a second superconductive layer on the non-superconductive layer, wherein both the first and second superconductive layers, and the non-superconductive layer are epitaxial with a c-axis in a direction substantially normal to the plane of the first and second planar segments, and the layers are of substantially uniform thickness in the three segments.
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