发明名称 Integrated device with a structure for protection against high electric fields
摘要 An integrated device including a structure for protection against electric fields. The protection structure may include a first region of conducting material electrically connected to the gate/source region of the device at a first potential. The protection structure may also include a second region of conducting material electrically connected to the drain region of the device at a second potential differing from the first. In one embodiment, the first region of conducting material is comb-shaped, and includes a first number of fingers separated by a plurality of gaps. The second region of conducting material includes portions extending at the aforementioned gaps to form a comb structure. Thus, the body of semiconductor material of the device sees a protection region formed by a pair of interlocking comb structures at an intermediate potential between the first and second potentials.
申请公布号 US5777366(A) 申请公布日期 1998.07.07
申请号 US19950553154 申请日期 1995.11.07
申请人 SGS-THOMSON MICROELECTRONICS S.R.L. 发明人 CONTIERO, CLAUDIO;DEPETRO, RICCARDO
分类号 H01L21/8234;H01L27/088;H01L29/06;H01L29/417;H01L29/423;H01L29/78;(IPC1-7):H01L23/62 主分类号 H01L21/8234
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