| 发明名称 |
Phosphonomethylated chitosans |
| 摘要 |
Phosophonomethylated chitosans containing repeating units of formula <IMAGE> (1) wherein R1 is hydrogen or a radical of formula <IMAGE> (1a) R2 is a radical of formula (1a), X1 and X2 are each independently of the other hydrogen, C1-C5alkyl or an alkali metal ion or ammonium ion and n is 50 to 4000, have versatile utilities as sequestrants, stabilizers for bleaching agents as well as humectants in cosmetic compositions.
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| 申请公布号 |
US5777091(A) |
申请公布日期 |
1998.07.07 |
| 申请号 |
US19950560264 |
申请日期 |
1995.11.21 |
| 申请人 |
CIBA SPECIALTY CHEMICALS CORPORATION |
发明人 |
KUHN, MARTIN;MAIER, THOMAS;STEHLIN, ALBERT |
| 分类号 |
D06L3/00;A61K8/00;A61K8/72;A61K8/73;A61Q5/00;A61Q17/04;A61Q19/00;C08B37/08;C09K3/00;C11D3/22;C11D3/39;C11D3/395;D06L3/02;(IPC1-7):C08B37/08 |
主分类号 |
D06L3/00 |
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