发明名称 |
Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer |
摘要 |
A composition for irradiation with an ionizing radiation, characterized by comprising: (a) 0.01 to 30 parts by weight of a soluble aniline polymer which comprises one or both of the repeating units represented by the following general formulae (1) and (2), said repeating units being included at least 80% of the total repeating units, possesses a weight average molecular weight of not less than 10,000, and is solid at room temperature; and (b) 100 parts by weight of a solvent, <IMAGE> (1) <IMAGE> (2) wherein R1 to R4 represent an electron-donating group, Y1 to Y4 represent -SO3- or -COO-, and M1 to M4 represent a hydrogen ion, an ammonium ion, an a1kyl ammonium ion with 1 to 8 carbon atoms, an aromatic ammonium ion, or a quaternary ion of an aromatic heterocyclic ring.
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申请公布号 |
US5776659(A) |
申请公布日期 |
1998.07.07 |
申请号 |
US19960762877 |
申请日期 |
1996.12.12 |
申请人 |
FUJITSU LIMITED;NITTO CHEMICAL INDUSTRY CO., LTD. |
发明人 |
WATANABE, KEIJI;YANO, EI;NAMIKI, TAKAHISA;YANO, KEIKO;MARUYAMA, TAKASHI;NAKAMURA, TOMIO;SHIMIZU, SHIGERU;SAITOH, TAKASHI;UZAWA, MASASHI;ISHIKAWA, MASAMI |
分类号 |
G03F7/004;C08G73/00;C08G73/02;C08L79/00;C08L79/08;C09D5/00;C09D179/00;C09D179/08;G03F7/09;G03F7/11;G03F7/20;G03F7/26;H01L21/027;H01L21/265;H01L21/266;H01L21/66;(IPC1-7):G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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