| 摘要 |
A new method for manufacturing a porous polishing pad by implanting metallic or polymeric filings as pore former on a backing cloth/film inside an electric and/or magnetic field, coating the pad polymer onto the implanted filings and, thereafter, etc away or dissolve the pore former; the pores of the porous polymer can be controlled by the filing size and shape. The pore orientation, density and pattern can also be controlled. This porous polishing pad has consistent pore size, shape, orientation and density, and a flat surface; the pad polymer can be coated in different patterns. This new polishing pad is able to maintain constant polishing conditions and hence, produces a planar and super mirror-polished surface.
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