METHOD FOR SUPPLYING GAS TO A CHAMBER AND METHOD FOR REGULATING THE CONTENT OF A GIVEN ELEMENT IN THE ATMOSPHERE OF SUCH A CHAMBER

摘要

The invention concerns a method for the gas supply of a chamber (3, 12) supplied by a supply network comprising at least a primary line (1, 9, 10), connected in its upstream part to a source of said gas (5), and at least two respective secondary lines (1i, 9i, 10i) connected to the primary line. The method is characterised in that it consists in measuring the content of one given element in the atmosphere of the chamber in at least one point of the chamber, comparing the measured content with at least one predetermined reference value for the content of said element in the atmosphere of the chamber in said point, and varying, if required, depending on the result of this comparison, the gas pressure at one of the points (Ai) of the network.