发明名称 Multistep method of manufacturing semiconductor wafers
摘要 <p>There is disclosed a method of manufacturing a semiconductor wafer which includes at least a slicing process for slicing a semiconductor monocrystalline ingot in order to obtain a disc-shaped semiconductor wafer. In the method, the sliced semiconductor wafer is etched before being transported to a subsequent process. Even when a monocrystalline ingot having a large diameter is sliced through use of a wire saw, the method prevents generation of breakage, cracks, chips, or the like in processes subsequent to the slicing process, thereby enabling production of large-diameter wafers with high productivity and high yield through utilization of the advantage of the wire saw in slicing a large-diameter monocrystalline ingot; i.e., high cutting speed and a small amount of slicing stock removal. &lt;IMAGE&gt;</p>
申请公布号 EP0850737(A2) 申请公布日期 1998.07.01
申请号 EP19970310040 申请日期 1997.12.12
申请人 SHIN-ETSU HANDOTAI COMPANY LIMITED 发明人 TOYAMA, KOHEI;TAKAMIZAWA, SHOICHI;ARAMAKI, KANEYOSHI
分类号 H01L21/304;B28D5/00;H01L21/302;(IPC1-7):B28D5/00 主分类号 H01L21/304
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