Nieuw amide- of imide-bevattend copolymeer, de bereiding daarvan en een fotoresist die het omvat.

摘要

A novel copolymer useful for photoresist, which allows a formation of patterns showing a significantly improved resolution in a photolithography using ArF (193 nm) light source, is prepared by copolymerizing at least two cycloaliphatic olefins with an amide or imide.