| 摘要 |
<p>A coating apparatus according to the invention comprises a spin chuck (52) for holding a substrate, resist solution tanks (71, 711 to 71n) which contain a primary resist solution, a thinner tank (72, 721) which contains thinner, a confluence valve (75, 751) communicating with the thinner tank and the resist solution tanks, first pumps (73, 731 to 73n) each for supplying the confluence valve with the primary resist solution from a corresponding one of the resist solution tanks, a second pump (74, 741) for supplying thinner from the thinner tank to the confluence valve, a mixer (76, 761) for mixing the primary treatment solution and thinner supplied from the confluence valve, a nozzle (86, 861) for applying a solution from the mixer, to the substrate held by the spin chuck, and a controller (131, 431) for controlling the first and second pumps to adjust the mixture ratio of the primary resist solution to be supplied from each of the resist solution tanks (71, 711 to 71n) to the confluence valve (75, 751), to thinner to be supplied from the thinner tank (72, 721) to the confluence valve (75, 751). <IMAGE></p> |
